Photoresist material for 157-nm photolithography

Materials Science and Engineering C

Volumn 15, Issue 1-2, 2001, Pages 159-161

  Sarantopoulou, E ^a   Cefalas, A C ^a   Argitis, P ^b   Gogolides, E ^b  

^a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE   (Greece)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

Mass spectroscopy; Photolithography; Photoresistive material

Indexed keywords

ABSORPTION; COPOLYMERS; DISSOCIATION; PHOTOLITHOGRAPHY; PHOTONS;

LOW LASER ENERGY;

PHOTORESISTORS;

SPECTROSCOPY;

EID: 0034838483     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(01)00307-1     Document Type: Article

References (8)