Engineering study of extreme ultraviolet interferometric lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 2, 2009, Pages

  Jiang, Fan ^a   Cheng, Yang Chun ^b   Isoyan, Artak ^b,c   Cerrina, Franco ^a  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; DIFFRACTION GRATINGS; INTERFEROMETRY; LASER PULSES; MOIRE FRINGES; ULTRAVIOLET DEVICES; WAVEMETERS;

ACCURATE ANALYSIS; ATTENTION TO DETAILS; DIFFRACTION THEORIES; EXPOSURE SYSTEMS; EXTREME ULTRAVIOLETS; FRINGE PATTERNS; HIGH-ACCURACY; INTERFEROMETRIC LITHOGRAPHIES; MODELING TOOLS; NANOPATTERNING TECHNIQUES; NUMERICAL MODELS; PARTIAL COHERENCES; PHOTORESIST MATERIALS; PHYSICAL CONDITIONS; PHYSICAL PROCESS; PHYSICAL STRUCTURES; RAYLEIGH; SHORT WAVELENGTHS; TWO BEAMS;

MODELS;

EID: 64549147480     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3112006     Document Type: Article

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