Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Isoyan, Artak ^a   Cheng, Yang Chun ^a   Jiang, Fan ^a   Wallace, John ^a   Efremov, Mikhail ^b   Nealey, Paul ^b   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

EUV; Interferometric lithography

Indexed keywords

BEAM LINES; CENTER FOR NANOTECHNOLOGY; CHARACTERIZATION STUDIES; DOUBLE EXPOSURE; EUV; EXTREME ULTRAVIOLET; INTERFERENCE PATTERNS; INTERFEROMETRIC LITHOGRAPHY; KEY COMPONENT; NANOPATTERNING; PERIODIC PATTERN; PHOTORESIST MATERIALS; SELF-ASSEMBLED; UNIVERSITY OF WISCONSIN; ZERO ORDER;

INTERFEROMETRY; PHOTORESISTS;

LITHOGRAPHY;

EID: 45249095143     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772681     Document Type: Conference Paper

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