Partially coherent extreme ultraviolet interference lithography for 16 nm patterning research

Applied Physics Letters

Volumn 93, Issue 8, 2008, Pages

  Goldstein, M ^a   Wuest A ^a   Barnhart, D ^b  

^a SEMATECH   (United States)

^b Optica Software Division   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTOELECTRONIC DEVICES;

COHERENT INTERFERENCES; COUPLED-WAVE THEORY; INTERFERENCE LITHOGRAPHY; WAVELENGTH RADIATION;

RAY TRACING;

EID: 51349146916     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2973178     Document Type: Article

References (19)

1. H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, Appl. Phys. Lett. 75, 2328 (1999).
2. Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
3. V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
4. M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
5. M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, Proceedings of the 2006 International Symposium on EUV Lithography, Barcelona, 2006 (unpublished).
6. Ph. Michallon, A. Lagrange, C. Constancias, and B. Dal'zotto, Proceedings of the 2007 International Symposium on EUV Lithography, Sapporo, 2007 (unpublished).
7. P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
8. See http://www.opticasoftware.com for ray-trace simulation software.
9. H. H. Solak and Y. Ekinci, J. Vac. Sci. Technol. B 23, 2705 (2005).
10. J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, J. Vac. Sci. Technol. B 17, 3306 (1999).
11. D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, Cambridge, England, 1999).
12. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, 181 (1993).
13. E. N. Glytsis and T. K. Gaylord, J. Opt. Soc. Am. A 4, 2061 (1987).
14. See http://www-cxro.lbl.gov for material optical properties in the EUV region
15. See http://www.gsolver.com for RCWA simulation software tools.
16. A. Isoyan, A. Wüest, J. Wallace, F. Jiang, and F. Cerrina, Opt. Express 16, 9106 (2008).
17. P. P. Naulleau, C. H. Cho, E. M. Gullikson, and J. Bokor, J. Synchrotron Radiat. 7, 405 (2000).
18. S. F. Horne, M. M. Besen, D. K. Smith, P. A. Blackborow, and R. D'Agostino, Proc. SPIE 6151, 61510P (2006).
19. A. R. Libertun, X. Zhang, A. Paul, E. Gagnon, T. Popmintchev, S. Backus, M. M. Murnane, and H. C. Kapteyn, Appl. Phys. Lett. 84, 3903 (2004).