Influence of line edge roughness (LER) on angular resolved and on spectroscopic scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7155, Issue , 2008, Pages

  Schuster, Thomas ^a   Rafler, Stephan ^a   Frenner, Karsten ^a   Osten, Wolfgang ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

High resolution metrology; LER; Line edge roughness; OCD; Scatterometry; Wafer inspection

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; INSPECTION; MEASUREMENTS; PHOTORESISTS; SEMICONDUCTOR LASERS; SPECTROSCOPIC ELLIPSOMETRY;

HIGH RESOLUTION METROLOGY; LER; LINE EDGE ROUGHNESS; OCD; SCATTEROMETRY; WAFER INSPECTION;

ROUGHNESS MEASUREMENT;

EID: 57549086434     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814532     Document Type: Conference Paper

References (37)

1. X. Niu, N. Jakatdar, J. Bao, C. Spanos, S. Yedur, "Specular spectroscopic scatterometry in DUV lithography", Proc. SPIE3677 159-168(1999)
2. X. Niu, N. Jakatdar, J. Bao, C. Spanos, "Specular Spectroscopic DUV Scatterometry", IEEE Transactions on Semiconductor Manufacturing 14(2) 97-111 (2001)
3. D.H. Ziger, T.E. Adams, J.G. Garofalo, "Linesize effects on ultraviolet reflectance spectra", Optical Engineering 36(1), 243-250 (1997)
4. S.H. Zaidi, S.L. Prins, J.R. McNeil, S.S.H. Naqvi, "Metrology sensors for advanced resists", Proc. SPIE 2196 341-351 (1994)
5. P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, P. Chaton, "Optical Fourier Transform Scatterometry for LER and LWR metrology", Proc. SPIE 5725 (2005) 192-203
6. C.J. Raymond, "Scatterometry for Semiconductor Metrology", in A. Diebold (ed.), Handbook of Silicon Semiconductor Metrology, Marcel Dekker, New York, 2001
7. C.J. Raymond, "Overview of scatterometry applications in high volume silicon manufacturing", AIP Conference Proceedings 788, 394-402 (2005)
8. C.J. Raymond, "Comparison of solutions to the scatterometry inverse problem", Proc. SPIE 5375, 564-575 (2004)
9. 4 on Si by the Use of Grating Test Patterns", J. Electrochem. Soc. 125(5), 798-803 (1978)
10. H.P. Kleinknecht, H. Meier, "Linewidth measurements on IC masks and wafers by grating test patterns", Appl. Opt. 19(4) 525-233 (1980)
11. H.L. Kasdan, N. George, "Linewidth measurement by diffraction pattern analysis", Proc. SPIE 80, 54-63 (1976)
12. H. Kubota, S. Ǐnoué, "Diffraction Images in the Polarizing Microscope", J. Opt. Soc. Am A 49(2), 191-198 (1959)
13. R.M. Silver, B.M. Barnes, R. Attota, J. Jun, M. Stacker, E. Marx, H.J. Patrick, "Scatterfield Microscopy for extending the limits of image-based optical metrology", Appl. Opt. 46(20), 4248-4257 (2007)
14. J.R. McNeil, S.S.H. Naqvi, S.M. Gaspar, K.C. Hickman, K.P. Bishop, L.M. Milner, R.H. Krukar, G.A. Petersen, "Scatterometry Applied to Microelectronics Processing", Microlithography World Nov/Dec 1992,16-22
15. J. Petit, P. Barritault, J. Hazart, P. Chaton, P. Boher, M. Luet, T. Leroux, "A new analysis strategy for CD metrology using rapid photo goniometry method", Proc. SPIE 5375, 210-221 (2004)
16. P. Boher, M. Luet, J. Petit, P. Barritault, J. Hazart, P. Chaton, "Innovative Rapid Photo-goniometry method for CD metrology", Proc. SPIE 5375, 1302-1313 (2004)
17. J. Petit, P. Boher, T. Leroux, P. Barritault, J. Hazart, P. Chaton, "Improved CD and overlay metrology using an Optical Fourier Transform instrument", Proc. SPIE 5752, 420-428 (2005)
18. R.M. Silver, R. Attota, E. Marx, "Model-based Analysis of the Limits of Optical Metrology with Experimental Comparisons", Proc. SPIE 6617,66170W-1-66170W-13 (2007)
19. J. Bischoff, L. Hutschenreuther, H. Truckenbrodt, A. Bauer, U. Haak, T. Skaloud, "Characterization of 3D resist patterns by means of optical scatterometry", Proc. SPIE 3743, 49-60 (1999)
20. R. Quintanilha, P. Thony, D. Henry, J. Hazart, "3D-Features Analysis Using Spectroscopic Scatterometry", Proc. SPIE 5375, 456-467 (2004)
21. R. Quintanilha, J. Hazart, P. Thony, D. Henry, "Application of spectroscopic scatterometry method in hole matrices analysis", Proc. SPIE 5752, 204-216 (2005)
22. P. Reinig, R. Dost, M. Mört, T. Hingst, U. Mantz, J. Moffit, S. Shakya, C. Raymond, M. Littau, "Metrology of deep trench etched memory structures using 3D scatterometry", Proc. SPIE 5725, 559-569 (2005)
23. T. Schuster, J. Kauffmann, N. Kerwien, H. Tiziani, W. Osten and P. Reinig, "Scatterometrie an Kreuzgitterstrukturen", Proc. DGaO 2006
24. T. Schuster, S. Rafler, W. Osten, P. Reinig, T. Hingst, "Scatterometry from crossed grating structures in different configurations", Proc. SPIE 6617, 661715-1 - 661715-9 (2007)
25. T. Schuster, N. Kerwien, W. Osten, P. Reinig, M. Moert, T. Hingst, and U. Mantz, "Effect of linewidth fluctuations and sidewall roughness in scatterometry", Talk on "Conference on Lasers and Electro-Optics" (CLEO Europe), Munich 12-17 June 2005
26. R. Quintanilha, J. Hazart, P. Thony, D. Henry, "Influence of the real-life structures in optical metrology using spectroscopic scatterometry analysis", Proc. SPIE 5858, 58580C-1 - 58580C-12 (2005)
27. T.A. Germer, "Modeling the effect of line profile variation on optical critical dimension metrology", Proc. SPIE 6518,65180Z-1 - 65180Z-9 (2007) 28.T.A. Germer, "Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure", J. Opt. Soc. Am. A 24(3), 696-701 (2007)
28. B. Yaakobovitz, Y. Cohen, Y Tsur, "Line edge roughness detection using deep UV light scatterometry", Microelectronic Engineering 84, 619-625 (2007)
29. http://www.itrs.net/
30. M. Schubert, B. Rheinländer, J. Woollam, B. Johs and C. Herzinger, "Extension of rotating-analyzer ellipsometry to generalized ellipsometry: determination of the dielectric function tensor from uniaxial TiO2", J. Opt. Soc. Am. A 13(4), 875-883 (1996)
31. M. Totzeck, "Numerical simulation of high-NA quantitative polarization microscopy and corresponding near-fields", Optik 112(9), 399-406 (2001)
32. J. Turunen, K. Kuittinen, F. Wyrowski, "Diffractive Optics: Electromagnetic Approach", Progress in Optics 40, 341-387 (2000)
33. M. Moharam, E. Grann, D. Pommet and T. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings", J. Opt. Soc. Am. A 12(5), 1068-1076 (1995)
34. M. Moharam, D. Pommet, E. Grann and T. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach", J. Opt. Soc. Am. A 12(5), 1077-1086 (1995)
35. L. Li, "New formulation of the Fourier modal method for crossed surface-relief gratings", J. Opt. Soc. Am. A, 14(10), 2758-2767 (1997)
36. T. Schuster, J. Ruoff, N. Kerwien, S. Rafler, W. Osten, "Normal vector method for convergence improvement using the RCWA for crossed gratings", J. Opt. Soc. Am. A 24(9), 2880-2890 (2007)
37. R. Azzam, N. Bashara, Ellipsometry and polarized light, North Holland, Amsterdam, New York, Oxford, 1977