Metrology of deep trench etched memory structures using 3D scatterometry

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 559-569

  Reinig, Peter ^a   Dost, René ^a   Mört, Manfred ^a   Hingst, Thomas ^a   Mantz, Ulrich ^a   Moffitt, Jasen ^b   Shakya, Sushil ^b   Raymond, Christopher J ^c   Littau, Mike ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b INFINEON TECHNOLOGIES   (United States)

^c Accent Optical Technologies   (United States)

Author keywords

CD; Control; Diffraction; Etch; Memory; Metrology; Optical; Process; Scatterometry; Trench

Indexed keywords

LINE-SPACE GRATINGS; OPTICAL METROLOGY; PARAMETER CROSS CORRELATIONS; RIGOROUS COUPLED WAVE ANALYSIS (RCWA);

CORRELATION THEORY; DIFFRACTION GRATINGS; ETCHING; LIGHT REFLECTION; LIGHT SCATTERING; OPTIMIZATION; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY;

MEASUREMENT THEORY;

EID: 24644452025     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599342     Document Type: Conference Paper

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