A new analysis strategy for CD metrology using rapid photo goniometry method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 210-221

  Petit, J ^a   Barritault, P ^b   Hazart, J ^b   Chaton, P ^b   Boher, P ^a   Luet, M ^a   Leroux, T ^a  

^a ELDIM   (France)

^b CEA GRENOBLE   (France)

Author keywords

Fourier optics; OFT; Photo goniometry; RCWA; Scatterometry

Indexed keywords

OFT; PHOTO-GONIOMETRY; RCWA; SCATTEROMETRY;

ALGORITHMS; ELLIPSOMETRY; FOURIER OPTICS; LIGHT SCATTERING; LIQUID CRYSTAL DISPLAYS; MICROELECTRONICS; PARAMETER ESTIMATION; REAL TIME SYSTEMS; REFLECTION; REGRESSION ANALYSIS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS;

DIFFRACTION GRATINGS;

EID: 4344715810     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533031     Document Type: Conference Paper

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