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Volumn 5752, Issue I, 2005, Pages 192-203

Optical fourier transform scatterometry for LER and LWR metrology

Author keywords

AFM; Fourier optics; LER; Line edge roughness; Line width roughness; LWR; OFT; Scatterometry

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION; FOURIER OPTICS; FOURIER TRANSFORMS; LIGHTING;

EID: 24644432953     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.594526     Document Type: Conference Paper
Times cited : (45)

References (18)
  • 3
    • 3843130605 scopus 로고    scopus 로고
    • Effect of line edge roughnes (LER) and line width roughness (LWR) on sub 100nm device performance
    • J. Lee, J. Shin, H. Kim, S. Woo, H. Cho, W. Han, J. Moon, "Effect of line edge roughnes (LER) and line width roughness (LWR) on sub 100nm device performance", SPIE 5376, 426, 2004
    • (2004) SPIE , vol.5376 , pp. 426
    • Lee, J.1    Shin, J.2    Kim, H.3    Woo, S.4    Cho, H.5    Han, W.6    Moon, J.7
  • 4
    • 4344674373 scopus 로고    scopus 로고
    • Determination of optimal parameters for CD-SEM measurement of line edge roughness
    • B. Bunday, M. Bishop, D. McCormack, "Determination of optimal parameters for CD-SEM measurement of line edge roughness", SPIE 5375, 515, 2004
    • (2004) SPIE , vol.5375 , pp. 515
    • Bunday, B.1    Bishop, M.2    McCormack, D.3
  • 5
    • 4344698729 scopus 로고    scopus 로고
    • Study of 3D metrology techniques as an alternative to cross sectional analysis at the R&D level
    • J. Foucher, K. Miller, "Study of 3D metrology techniques as an alternative to cross sectional analysis at the R&D level", SPIE 5375, 444, 2004
    • (2004) SPIE , vol.5375 , pp. 444
    • Foucher, J.1    Miller, K.2
  • 8
    • 0036029338 scopus 로고    scopus 로고
    • Fundamental solutions for real time optical CD metrology
    • Metrology, Inspection and Process Control for Microlithography
    • J. Opsal, H. Chu, Y. Wen, Y.C. Chang, G. Li, "Fundamental solutions for real time optical CD metrology". Metrology, Inspection and Process Control for Microlithography, SPIE vol. 4689, 163, 2002
    • (2002) SPIE , vol.4689 , pp. 163
    • Opsal, J.1    Chu, H.2    Wen, Y.3    Chang, Y.C.4    Li, G.5
  • 9
    • 0036031168 scopus 로고    scopus 로고
    • Spectroscopic CD metrology for sub 100nm lithography process control
    • Metrology, Inspection and Process Control for Microlithography
    • W. D. Mieher, T. G. Dziura, X. Chen, P. DeCecco, A. Levy, "Spectroscopic CD metrology for sub 100nm lithography process control", Metrology, Inspection and Process Control for Microlithography, SPIE vol. 4689, 957, 2002
    • (2002) SPIE , vol.4689 , pp. 957
    • Mieher, W.D.1    Dziura, T.G.2    Chen, X.3    DeCecco, P.4    Levy, A.5
  • 10
    • 4344707465 scopus 로고    scopus 로고
    • Optical digital profilometry: A breakthrough technology for nondestructive in line profile and CD metrology
    • K. Barry, M. laughery, N. Jakatdar, W. Chang, "Optical digital profilometry: a breakthrough technology for nondestructive in line profile and CD metrology", Semiconductor Fabtech, 197, vol.15, 2001
    • (2001) Semiconductor Fabtech , vol.15 , pp. 197
    • Barry, K.1    Laughery, M.2    Jakatdar, N.3    Chang, W.4
  • 11
    • 0029306568 scopus 로고
    • Stable implementation of the rigorous coupled-wave analysis for surface relief gratings
    • M.G. Moharam, D.PA. Pommet, E.B. Grann, T. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface relief gratings", J. Opt. Soc. Am., A12, 1077, 1995
    • (1995) J. Opt. Soc. Am. , vol.A12 , pp. 1077
    • Moharam, M.G.1    Pommet, D.P.A.2    Grann, E.B.3    Gaylord, T.4
  • 12
    • 0005357405 scopus 로고
    • Fast contrast versus viewing angle measurements for LCDs
    • T. Leroux, "Fast contrast versus viewing angle measurements for LCDs", Proc. EURODISPLAY, 447, 1993
    • (1993) Proc. EURODISPLAY , pp. 447
    • Leroux, T.1
  • 13
    • 4344676541 scopus 로고
    • Fast analysis of LCD contrast and color coordinates versus viewing angle
    • T. Leroux, C. Rossignol, "Fast analysis of LCD contrast and color coordinates versus viewing angle", SID Proceedings. 73, 1995
    • (1995) SID Proceedings , pp. 73
    • Leroux, T.1    Rossignol, C.2
  • 15
    • 4344715810 scopus 로고    scopus 로고
    • A new analysis strategy for CD metrology using rapid photo-goniometry method
    • J. Petit, P. Barritault, J. Hazart, P. Chaton, P. Boher, M. Luet, T. Leroux, "A new analysis strategy for CD metrology using rapid photo-goniometry method", SPIE 5375, 210, 2004
    • (2004) SPIE , vol.5375 , pp. 210
    • Petit, J.1    Barritault, P.2    Hazart, J.3    Chaton, P.4    Boher, P.5    Luet, M.6    Leroux, T.7
  • 16
    • 4344693772 scopus 로고    scopus 로고
    • Preliminary evaluation of line edge roughness metrology based on CD-SAXS
    • R. Jones, T. Lu, C. Soles, E. lin, W. Wu, D. Cas, A. Mahorowala, "Preliminary evaluation of line edge roughness metrology based on CD-SAXS", SPIE 5375, 191, 2004
    • (2004) SPIE , vol.5375 , pp. 191
    • Jones, R.1    Lu, T.2    Soles, C.3    Lin, E.4    Wu, W.5    Cas, D.6    Mahorowala, A.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.