Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 24, Issue 3, 2007, Pages 696-701

  Germer, Thomas A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; EDGE DETECTION; REFLECTION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS;

LINEWIDTH VARIATIONS; SILICON GRATING; STOKES REFLECTANCE;

DIFFRACTION GRATINGS;

EID: 34047181113     PISSN: 10847529     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAA.24.000696     Document Type: Article

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