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1
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4344588061
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Evaluation of new in-chip and arrayed line overlay target designs
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R. Attota, R. M. Silver, M. Bishop, E. Marx, J. Jun, M. Stocker, M. P. Davidson, and R. Larrabee, "Evaluation of new in-chip and arrayed line overlay target designs," Proc. SPIE 5375, 395-402 (2004).
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2
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4344673159
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Target noise in overlay metrology
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J. Seligson, M. Adel, P. Izikson, V. Levinski, and D. Yaffe, "Target noise in overlay metrology," Proc. SPIE 5375, 403-412 (2004).
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3
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Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control
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E. Solecky and J. Morillo, "Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control," Proc. SPIE 5375, 41-50 (2004).
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Solecky, E.1
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Highresolution optical metrology
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R. M. Silver, R. Attota, M. Stocker, M. Bishop, L. Howard, T. Germer, E. Marx, M. Davidson, and R. Larrabee, "Highresolution optical metrology," Proc. SPIE 5752, 67-79 (2005).
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5
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High-resolution optical overlay metrology
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R. M. Silver, R. Attota, M. Stocker, M. Bishop, J. Jun, E. Marx, M. Davidson, and R. Larrabee, "High-resolution optical overlay metrology," Proc. SPIE 5375, 78-95 (2004).
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6
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24644476489
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Application of through-focus focusmetric analysis in high resolution optical microscopy
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R. Attota, R. M. Silver, T. Germer, M. Bishop, R. Larrabee, M. Stocker, and L. Howard, "Application of through-focus focusmetric analysis in high resolution optical microscopy," Proc. SPIE 5752, 1441-1449 (2005).
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7
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0036028585
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Comparison of measured optical image profiles of silicon lines with two different theoretical models
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R. M. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo, and M. Davidson, "Comparison of measured optical image profiles of silicon lines with two different theoretical models," Proc. SPIE 4689, 409-429 (2002).
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8
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The OMAG 3 reticle set
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Tech Transfer #03074417A-ENG International SEMATECH
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M. Bishop, R. Silver, and B. Bunday, "The OMAG 3 reticle set," Tech Transfer #03074417A-ENG (International SEMATECH, 2004).
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Bishop, M.1
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9
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Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multisample, multi-wavelength, multi-angle investigation
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C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woolam, and W. Paulson, "Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multisample, multi-wavelength, multi-angle investigation," J. Appl. Phys. 83, 3323-3336 (1998).
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Paulson, W.5
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10
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33745635704
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The limits of image-based optical metrology
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R. M. Silver, B. Barnes, R. Attota, J. Jun, J. Filliben, J. Soto, M. Stocker, P. Lipscomb, E. Marx, H. Patrick, R. Dixson, and R. Larrabee, "The limits of image-based optical metrology," Proc. SPIE 6152, 61520Z (2006).
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Silver, R.M.1
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11
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Simulation of optical microscope images of photomask feature size measurements
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IEEE
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E. Marx and J. Potzick, "Simulation of optical microscope images of photomask feature size measurements," in IEEE Antennas and Propagation Society International Symposium (IEEE, 2005), Vol. 3B, pp. 243-246.
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Marx, E.1
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12
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0031382539
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A comparison between rigorous light scattering methods
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M. Davidson, B. H. Kleemann, and J. Bischoff, "A comparison between rigorous light scattering methods," Proc. SPIE 305, 606-619 (1997).
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