Overview of scatterometry applications in high volume silicon manufacturing

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 394-402

  Raymond, Christopher ^a  

^a Accent Optical Technologies   (United States)

Author keywords

Angular; CD; Control; Diffraction; Metrology; Optical; Process; Scatterometry

Indexed keywords

EID: 33745609063     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2062993     Document Type: Conference Paper

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