Characterization of 3D resist patterns by means of optical scatterometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3743, Issue , 1999, Pages 49-60

  Bischoff, Joerg ^a   Hutschenreuther, L ^a   Truckenbrodt, H ^a   Bauer, A ^a   Haak, U ^a   Skaloud, T ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHARACTERIZATION; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; LIGHT REFLECTION; MICROELECTRONICS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; THREE DIMENSIONAL;

CONTACT HOLES; DIFFRACTION THEORY; DOT ARRAYS; OPTICAL SCATTEROMETRY; RESIST PATTERNS; RIGOROUS COUPLED WAVE APPROACH;

OPTICAL VARIABLES MEASUREMENT;

EID: 0032674119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.346936     Document Type: Conference Paper

References (7)