Specular spectroscopic scatterometry in DUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 159-168

  Niu, Xinhui ^a   Jakatdar, Nickhil ^a   Bao, Junwei ^a   Spanos, Costas ^a   Yedur, Sanjay ^a  

^a Timbre Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; ELLIPSOMETRY; LIGHT SCATTERING; NONDESTRUCTIVE EXAMINATION; SPATIAL VARIABLES MEASUREMENT; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION (CD) METROLOGY; SPECULAR SPECTROSCOPIC SCATTEROMETRY (SSS);

PHOTOLITHOGRAPHY;

EID: 0032632458     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350802     Document Type: Conference Paper

References (9)