Effect of linewidth fluctuations and sidewall roughness in scatterometry

Conference on Lasers and Electro-Optics Europe - Technical Digest

Volumn , Issue , 2005, Pages 451-

  Schuster, Thomas ^a   Kerwien, Norbert ^a   Osten, Wolfgang ^a   Reinig, Peter ^b   Moert, Manfred ^b   Hingst, Thomas ^b   Mantz, Ulrich ^b  

^a UNIVERSITY OF STUTTGART   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; COMPUTATIONAL METHODS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; PARAMETER ESTIMATION; SCANNING ELECTRON MICROSCOPY;

LINEWIDTH FLUCTUATIONS; RIGOROUS COUPLED WAVE ANALYSIS; SCATTEROMETRY; SIDEWALL ROUGHNESS;

REMOTE SENSING;

EID: 37649028761     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CLEOE.2005.1568229     Document Type: Conference Paper

References (0)