Linesize effects on ultraviolet reflectance spectra

Optical Engineering

Volumn 36, Issue 1, 1997, Pages 243-250

  Ziger, David H ^a,d,e,f,g   Adams, Thomas E ^b,f,h,i   Garofalo, Joseph G ^c,j  

^a VLSI Technology Inc   (United States)

^b NOKIA RESEARCH CENTER   (United States)

^c LUCENT TECHNOLOGIES   (United States)

^d UNIVERSITY OF WISCONSIN   (United States)

^e UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^f AT AND T LABS RESEARCH   (United States)

^g VLSI Inc   (United States)

^h Department of Environmental and Radiological Health Sciences   (United States)

ⁱ Department of Obstetrics Gynecology   (United States)

^j RUTGERS UNIVERSITY   (United States)

more..

Author keywords

DUV spectra; Linewidth monitoring; Ultraviolet pattern reflectivity

Indexed keywords

EID: 0343579745     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.601167     Document Type: Article

References (15)

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