157-nm single-layer resist based on a novel monocyclic fluorinated polymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 186-195

  Otoguro, Akihiko ^a   Irie, Shigeo ^a   Itani, Toshiro ^b   Fujii, Kiyoshi ^a   Takebe, Yoko ^c   Kawaguchi, Yasuhide ^c   Yokokoji, Osamu ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b RENESAS TECHNOLOGY CORP   (Japan)

^c ASAHI GLASS CO LTD   (Japan)

Author keywords

157 nm lithography; Chemically amplified resist; Dry etching resistance; Fluorinated polymer; Protecting group; Single layer resist

Indexed keywords

ADHESION; DISSOLUTION; DRY ETCHING; ELECTRIC RESISTANCE; FLUORINE CONTAINING POLYMERS; MASKS; PHASE SHIFT; RESINS;

CHEMICALLY AMPLIFIED RESISTS; FLUORINATED POLYMERS; SINGLE-LAYER RESISTS;

PHOTORESISTS;

EID: 3843079520     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535013     Document Type: Conference Paper

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