Deconstructing the resist to probe innate material roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Fedynyshyn, T H ^a   Sinta, R F ^a   Astolfi, D K ^a   Cabral, A ^a   Roberts, J ^b   Meagley, R ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Line edge roughness; PAG; Photoresist

Indexed keywords

FILM ROUGHNESS; INTRINSIC MATERIAL; LINE EDGE ROUGHNESS (LER); PAG;

ATOMIC FORCE MICROSCOPY; CONCENTRATION (PROCESS); DISSOLUTION; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS; TEMPERATURE DISTRIBUTION;

PHOTORESISTS;

EID: 33745607362     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654437     Document Type: Conference Paper

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