Room temperature processable silicon-containing molecular resist

Macromolecular Rapid Communications

Volumn 29, Issue 18, 2008, Pages 1532-1537

  Park, Ji Young ^a   Kim, Myung Gi ^a   Kim, Jin Baek ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Electron beam; Photoresist; Polyhedral oligomeric silsesquioxane; Trimethoxysilane

Indexed keywords

ACIDS; ELECTRIC LAMPS; ELECTRON BEAMS; ELECTRON GUNS; MERCURY (METAL); PARTICLE BEAMS; SILICON; XENON;

CONTACT PRINTINGS; CROSS-LINKING; M LINES; MOLECULAR RESISTS; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; PROCESSABLE; ROOM TEMPERATURES; SPACE PATTERNS; TRIMETHOXYSILANE; XENON LAMPS;

ELECTRON BEAM LITHOGRAPHY;

EID: 54949107758     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200800324     Document Type: Article

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