Percolation view of novolak dissolution. 5. The dissolution of exposed resist films

Macromolecules

Volumn 29, Issue 6, 1996, Pages 2082-2087

  Shih, Hsiao Yi ^a   Reiser, Arnost ^a  

^a POLYTECHNIC UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC COMPOUNDS; CARBOXYLIC ACIDS; DISSOLUTION; HYDROGEN BONDS; IMAGING SYSTEMS; IRRADIATION; LIGHT; PERCOLATION (SOLID STATE); PHENOLIC RESINS; PHOTOLYSIS; PHOTORESISTS; THERMAL EFFECTS;

DIAZONAPHTHOQUINONES; DIAZOQUINONE; NOVOLAK; RESIST FILMS;

SEMICONDUCTING FILMS;

EID: 0030104981     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma951668e     Document Type: Article

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