Novel photobleachable deep UV resists based on single component nonchemically amplified resist system

Macromolecular Rapid Communications

Volumn 26, Issue 17, 2005, Pages 1412-1417

  Kim, Jin Baek ^a   Kim, Kyoung Seon ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Deep UV; Diazoketo; Lithography; Photobleaching; Photoresists

Indexed keywords

AROMATIC COMPOUNDS; COPOLYMERIZATION; ORGANIC POLYMERS; PHOTOLITHOGRAPHY; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION; XENON;

BASE-SOLUBLE PHOTOPRODUCTS; DEEP UV RESISTS; DIAZOKETO GROUPS; PHOTOBLEACHING;

PHOTORESISTS;

EID: 24944477343     PISSN: 10221336     EISSN: None     Source Type: Journal    
DOI: 10.1002/marc.200500317     Document Type: Article

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