Diffraction gratings for generating varying-period interference patterns of surface plasmons

Journal of Optics A: Pure and Applied Optics

Volumn 10, Issue 9, 2008, Pages

  Bezus, E A ^a   Bykov, D A ^a   Doskolovich, L L ^b   Kadomin, I I ^a  

^a SAMARA NATIONAL RESEARCH UNIVERSITY   (Russian Federation)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

Diffraction; Diffraction grating; Interference pattern; Nanolithography; Surface plasmon

Indexed keywords

EID: 54749089537     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/1464-4258/10/9/095204     Document Type: Article

References (28)

1. McCord M A 1997 Electron beam lithography for 0.13 νm manufacturing J. Vac. Sci. Technol. B 15 2125-9
2. Melngailis J 1993 Focused ion beam lithography Nucl. Instrum. Methods Phys. Res. B 80 1271-80
3. McCord M A and Pease R F W 1986 Lithography with the scanning tunneling microscope J. Vac. Sci. Technol. B 4 86-8
4. Chou S Y, Krauss P R and Renstrom P J 1998 Nanoimprint lithography J. Vac. Sci. Technol. B 14 4129-33
5. Tan H, Gilbertson A and Chou S Y 1998 Roller nanoimprint lithography J. Vac. Sci. Technol. B 16 3926-8
6. Okazaki S 1991 Resolution limits of optical lithography J. Vac. Sci. Technol. B 9 2829-33
7. Rothschild M et al 1999 157 nm: deepest deepultraviolet yet J. Vac. Sci. Technol. B 17 3262-6
8. Gwyn C W, Stulen R, Sweeney D and Attwood D 1998 Extreme ultraviolet lithography J. Vac. Sci. Technol. B 16 3142-9
9. Goodberlet J G 2000 Patterning 100 nm features using deep-ultraviolet contact photolithography Appl. Phys. Lett. 76 667-9
10. Hoffnagle J A, Hinsberg D W, Sanchez M and Houle F A 1999 Liquid immersion deep-ultraviolet interferometric lithography J. Vac. Sci. Technol. B 17 3306-9
11. Silverman J P 1998 Challenges and progress in x-ray lithography J. Vac. Sci. Technol. B 16 3137-41
12. Guo X, Du J, Guo Y and Yao J 2006 Large-area surface-plasmon polariton interference lithography Opt. Lett. 31 2613-5
13. Shao D B and Chen S C 2005 Surface-plasmon-assisted nanoscale photolithography by polarized light Appl. Phys. Lett. 86 253107
14. Shao D B and Chen S C 2006 Direct patterning of three-dimensional periodic nanostructures by surface-plasmon assisted nanolithography Nano Lett. 6 2279-83
15. Derouard M, Hazart J, Lérondel G, Bachelot R, Adam P-M and Royer P 2007 Polarization-sensitive printing of surface plasmon interferences Opt. Express 15 4238-46
16. Alkaisi M M, Blaikie R J, McNab S J, Cheung R and Cumming D R S 1999 Sub-diffraction-limited patterning using evanescent near-field optical lithography Appl. Phys. Lett. 75 3560-2
17. Blaikie R J and McNab S J 2001 Evanescent interferometric lithography Appl. Opt. 40 1692-8
18. Luo X and Ishihara T 2004 Surface plasmon resonant interference nanolithography technique Appl. Phys. Lett. 84 4780-2
19. Luo X and Ishihara T 2004 Subwavelength photolithography based on surface-plasmon polariton resonance Opt. Express 12 3055-65
20. Martinez-Anton J C 2006 Surface relief subwavelength gratings by means of total internal reflection evanescent wave interference lithography J. Opt. A: Pure Appl. Opt. 8 S213-8
21. Srituravanich W, Fang N, Sun C, Luo Q and Zhang X 2004 Plasmonic nanolithography Nano Lett. 4 1085-8
22. Srituravanich W, Durant S, Lee H, Sun C and Zhang X 2005 Deep subwavelength nanolithography using localized surface plasmon modes on planar silver mask J. Vac. Sci. Technol. B 23 2636-9
23. Liu Z W, Wei Q H and Zhang X 2005 Surface plasmon interference nanolithography Nano Lett. 5 957-61
24. Jiao X 2006 Numerical simulation of nanolithography with the subwavelength metallic grating waveguide structure Opt. Express 14 4850-60
25. Doskolovich L L, Kadomina E A and Kadomin I I 2007 Nanoscale photolithography by means of surface plasmons interference J. Opt. A: Pure Appl. Opt. 9 854-7
26. Moharam M G, Pommet D A, Grann E B and Gaylord T K 1995 Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach J. Opt. Soc. Am. A 12 1077-86
27. Moharam M G, Grann E B, Pommet D A and Gaylord T K 1995 Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings J. Opt. Soc. Am. A 12 1068-76
28. Li L 1996 Use of Fourier series in the analysis of discontinuous periodic structures J. Opt. Soc. Am. A 13 1870-6