Large-area surface-plasmon polariton interference, lithography

Optics Letters

Volumn 31, Issue 17, 2006, Pages 2613-2615

  Guo, Xiaowei ^a   Du, Jinglei ^a   Guo, Yongkang ^a   Yao, Jun ^b  

^a SICHUAN UNIVERSITY   (China)

^b DURHAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BROAD BEAM ILLUMINATION; DIRECTIONAL INTENSITY; REFLECTION COUPLING MODE; SURFACE PLASMON POLARITON (SPP);

COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; EXCITONS; FINITE DIFFERENCE METHOD; REFLECTION; TIME DOMAIN ANALYSIS; WAVE INTERFERENCE;

LITHOGRAPHY;

EID: 33750520957     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.31.002613     Document Type: Article

References (16)

1. J. P. Spallas, A. M. Hawryluk, and D. R. Kania, J. Vac. Sci. Technol. B 13, 1973 (1995).
2. H. H. Solak and C. David, J. Vac. Sci. Technol. B 21, 2883 (2003).
3. M. M. Alkaisi, R. J. Blaikie, and S. J. McNab, Microelectron. Eng. 53, 237 (2000).
4. R. J. Blaikie and S. J. McNab, Appl. Opt. 40, 1692 (2001).
5. T. W. Ebbesen, H. J. Lezec, H. F. Ghaemi, T. Thio, and P. A. Wolff, Nature 391, 667 (1998).
6. X. G. Luo and T. Ishihara, Appl. Phys. Lett. 84, 4780 (2004).
7. Z. W. Liu, Q. H. Wei, and X. Zhang, Nano Lett. 5, 957 (2005).
8. K. Matsubara, S. Kawata, and S. Minami, Appl. Opt. 27, 1160 (1988).
9. H. Raether, Surface Plasmon on Smooth and Rough Surfaces and on Gratings (Springer-Verlag, 1988).
10. J. P. Berenger, Comput. Phys. 114, 185 (1994).
11. Y. Ohdaira, S. Hoshiyama, T. Kawakami, K. Shinbo, K. Kato, and F. Kaneko, Appl. Phys. Lett. 86, 051102 (2005).
12. J. C. Martinez-Anton, J. Opt. A 8, s213 (2006).
13. W. M. Moreau, Semiconductor Lithography: Principles, Practices, and Materials (Plenum, 1998).
14. X. Caide and S. F. Sui, Sens. Actuators B 66, 174 (2000).
15. J. C. Quail, J. G. Rako, and H. J. Simon, Opt. Lett. 8, 377 (1983).
16. V. Silin and A. Plant, Trends Biotechnol. 15, 353 (1997).