Reactive ion etching of waveguide structures in diamond

Diamond and Related Materials

Volumn 17, Issue 11, 2008, Pages 1831-1834

  Hiscocks, Mark P ^a   Kaalund, Christopher J ^a   Ladouceur, François ^a   Huntington, Shane T ^b   Gibson, Brant C ^b   Trpkovski, Steven ^b   Simpson, David ^b   Ampem Lassen, Eric ^b   Prawer, Steven ^b   Butler, James E ^c  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b UNIVERSITY OF MELBOURNE   (Australia)

^c NAVAL RESEARCH LABORATORY   (United States)

Author keywords

Diamond crystal; Diamond film; Optical properties; Reactive ion etching (RIE)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DIAMONDS; ETCHING; OPTICAL DESIGN; POWDERS; SINGLE CRYSTALS; WAVEGUIDE COMPONENTS; WAVEGUIDES;

CVD DIAMONDS; DIAMOND CRYSTAL; DIAMOND FILM; NANO-CRYSTALLINE; OPTICAL PROPERTIES; PHOTONIC STRUCTURES; REACTIVE ION ETCHING (RIE); SEM IMAGING; SIDE WALL ROUGHNESS; SINGLE CRYSTAL DIAMOND; WAVE GUIDE STRUCTURE;

REACTIVE ION ETCHING;

EID: 52049107374     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.04.019     Document Type: Article

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