Patterning and reactive ion etching of diamond films using light coupling masks

Materials Research Society Symposium Proceedings

Volumn 820, Issue , 2004, Pages 325-330

  Leech, Patrick W ^b   Reeves, Geoff K ^a   Holland, Anthony S ^a  

^a RMIT UNIVERSITY   (Australia)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTICITY; ELASTOMERS; ELECTRON BEAM LITHOGRAPHY; ETCHING; MASKS; REACTIVE ION ETCHING; SPUTTERING; SURFACE ROUGHNESS;

CONTACT LITHOGRAPHY; ETCH SELECTIVITY; LIGHT COUPLING MASKS (LCM); LITHOGRAPHIC PATTERNING;

DIAMOND FILMS;

EID: 14944383544     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-820-r5.2     Document Type: Conference Paper

References (9)

1. J.P. Sullivan, T.A. Friedmann and K. Hjort, MRS Bulletin, 26(4), 309 (2001).
2. M. Adamschik, M. Hinz, C. Maier, Diamond Relat. Mater. 10, 722 (2001).
3. H. Schmid, H. Biebutyck, B. Michekl, O.F.F. Martin, and N.B. Piller, J.Vac.Sci.Technol. B 16(6), 3422 (1998).
4. J.A. Rogers, A. Dobabalapur, Z. Bao, and H.E. Katz, Appl. Phys. Letts., 75(7), 1010 (1999).
5. P.W. Leech, G.K. Reeves and A.S. Holland, J. Materials Science, 36, 3453 (2001).
6. P.W. Leech, B. Sexton, F. Smith and R. Marnock, Microelectronic Eng., 71, 171 (2004). C. Steinbruchel, Appl. Phys. Letts., 55(19), 1960 (1989).
7. P.W. Leech, B. Sexton, F. Smith and R. Marnock, Microelectronic Eng., 71, 171 (2004). C. Steinbruchel, Appl. Phys. Letts., 55(19), 1960 (1989).
8. C. Steinbruchel, J.Electrochem.Soc., 130, 1960 (1983).
9. H. Shan, B.K. Srinivasan, D.J. Jillie, J.S. Multani and W.J. Lo, J. Electrochem. Soc., 141, 2904 (1994).