Pattern transfer of a 23 nm-period grating and sub-15 nm dots into CVD diamond

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 319-322

  Lister, K A ^a   Casey, B G ^b   Dobson, P S ^a   Thoms, S ^a   Macintyre, D S ^a   Wilkinson, C D W ^a   Weaver, J M R ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b Kelvin Nanotechnology Ltd   (United Kingdom)

Author keywords

Diamond; Hydrogen Silsesquioxane (HSQ); Nanofabrication; Nanolithography; Reactive ion etching

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; MASKS; NANOTECHNOLOGY; OXYGEN; PLASMAS; REACTIVE ION ETCHING; THERMAL EXPANSION;

HYDROGEN SILSESQUIOXANES (HSQ); MICROGRAPHS; PATTERN TRANSFER;

MICROELECTRONICS;

EID: 17344393859     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00118-2     Document Type: Conference Paper

References (13)

1. Casey B.G., Cumming D.R.S., Khandaker I.I., Curtis A.S.G., Wilkinson C.D.W. Microelectron. Eng. 46:1999;125-128.
2. Gadegaard N., Thoms S., Macintyre D.S., Mcghee K., Gallagher J., Casey B., Wilkinson C.D.W. Microelectron. Eng. 67-68:2003;162-168.
3. Wilkinson C.D.W., Riehle M., Wood M., Gallagher J., Curtis A.S.G. Mater. Sci. Eng. C. 19:2002;263-269.
4. Chou S.Y., Krauss P.R., Renstrom P.J. Appl. Phys. Lett. 67:1995;3114-3116.
5. Chou S.Y., Krauss P.R., Renstrom P.J. J. Vac. Sci. Technol. B. 14:1996;4129-4133.
6. Messina G., Paoletti A., Santangelo S., Tucciarone A. Microelectron. Eng. 34:1997;147-154.
7. Hirai Y., Yoshida S., Takagi N., Tanaka Y., Yabe H., Sasaki K., Sumitani H., Yamamoto K. Jpn. J. Appl. Phys. 42:2003;3863-3866.
8. Namatsu H., Yamaguchi T., Nagase M., Yamasaki K., Kurihara K. Microelectron. Eng. 41/42:1998;331-334.
9. Maile B.E., Henschel W., Kurz H., Rienks B., Polman R., Kaars P. Jpn. J. Appl. Phys. 39:2000;6836-6842.
10. van Delft F.C.M.J.M., Weterings J.P., van Langen-Suurling A.K., Romijn H. J. Vac. Sci. Technol. B. 18(6):2000;3419-3423.
11. Diamonex Incorported, 7331 William Ave, Allentown, PA 18106, USA.
12. Siew Y.K., Sarkar G., Hu X., Hui J., See A., Chua C.T. J. Electrochem. Soc. 147(1):2000;335-339.
13. Toyoda N., Hagiwara N., Matsuo J., Yamada I. Nucl. Instr. Meth. Phys. Res. B. 148:1999;639-644.