Micromachining of CVD diamond by RIE for MEMS applications

Diamond and Related Materials

Volumn 14, Issue 9, 2005, Pages 1543-1548

  Ding, G F ^a   Mao, H P ^a   Cai, Y L ^a   Zhang, Y H ^a   Yao, X ^a   Zhao, X L ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

CVD diamond film; Reactive ion etching (RIE); Sidewall passivation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; PRESSURE EFFECTS; REACTIVE ION ETCHING; SPUTTER DEPOSITION;

CVD DIAMOND FILMS; GAS PRESSURE; SELECTIVE DEPOSITION; SIDEWALL PASSIVATION;

DIAMOND FILMS;

EID: 21344442899     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.04.011     Document Type: Article

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