Ultrafine patterning of nanocrystalline diamond films grown by microwave plasma-assisted chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 9 B, 2007, Pages 6267-6271

  Gamo, Hidenori ^a   Shimada, Kentaro ^b   Nishitani Gamo, Mikka ^b   Ando, Toshihiro ^c  

^a TOPPAN PRINTING CO LTD   (Japan)

^b TOYO UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Chemical vapor deposition; Diamond; Electron beam lithography; Nanocrystalline; Reactive ion etching; Ultrafine patterning

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FILM GROWTH; METHANE; MICROFABRICATION; NANOCRYSTALLINE MATERIALS; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

NANOCRYSTALLINE DIAMOND FILMS; POLYCRYSTALLINE DIAMOND FILMS; TETRAFLUORO CARBON;

DIAMOND FILMS;

EID: 34648827575     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6267     Document Type: Article

References (11)

1. J. E. Field: The Properties of Diamond (Academic Press, London, 1979).
2. S. Matsumoto, Y. Sato, M. Kamo, and N. Setaka: Jpn. J. Appl. Phys. 21 (1982) L183.
3. S. Matsumoto, H. Kanda, Y. Sato, M. Kamo, and N. Setaka: Carbon 15 (1977) 299.
4. T. Utsumi: Jpn. J. Appl. Phys. 38 (1999) 7046.
5. T. Utsumi: J. Vac. Sci. Technol. B 17 (1999) 2897.
6. A. Fujishima, Y. Einaga, T. N. Rao, and D. A. Tryk: Diamond Electrochemistry (Elsevier, Amsterdam., 2005).
7. H. Shiomi: Jpn. J. Appl. Phys. 36 (1997) 7745.
8. S. Kim, B. K. Ju, Y. H. Lee, B. S. Park, Y. J. Baik, S. K. Lim, and M. H. Oh: J. Vac. Sci. Technol. B 15 (1997) 499.
9. J. W. Baldwin, M. Zalalutdinov, T. Feygelson, J. E. Butler, and B. H. Houston; J. Vac. Sci. Technol. B 24 (2006) 50.
10. G. S. Painter, D. E. Ellis, and A. R. Lubinsky: Phys. Rev. B 4 (1971) 36.1.0.
11. N. Setaka: Diamond Hakumaku Gijutsu (Sogo Gijutsu Center, Tokyo, 1988) p. 167 [in Japanese].