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Journal of Photopolymer Science and Technology

Volumn 15, Issue 3, 2002, Pages 427-434

The frog prince - A brief review of DUV resist technology

(2) Lee, DongKwan a Pawlowski, Georg a

a CLARIANT CORPORATION (United States)

Author keywords

Chemical amplification; Defect control; DUV lithography; Line edge roughness; Pattern collapse; RELACS; Thermal flow

Indexed keywords

POLYMER;

ARTICLE; FILM; LINE EDGE ROUGHNESS; LITHOGRAPHY; MICROPROCESSOR; SEMICONDUCTOR; TECHNOLOGY; TEMPERATURE; THICKNESS; ULTRAVIOLET RADIATION;

EID: 0036369085 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.427 Document Type: Article

Times cited : (10)

References (5)

1
- 0010225857
- in press
- (2002) Proc. SPIE Adv. Resist Technol. XIX , pp. 4690
- Dammel, R.¹

2
- 85036979127
- US 5,874,616 (1995)
- Howells, R.D.¹ Lamanna, W.D.² Fanta, A.D.³ Wadell, J.⁴

3
- 0010224473
- in press
- (2002) Proc. SPIE Adv. Resist Technol. XIX , pp. 4690
- Lee, D.K.¹ Ma, X.² Lamanna, W.M.³ Pawlowski, G.⁴

4
- 0010223177
- (2001) Proc. SPIE Adv. Resist Technol. Proc. XVIII , vol.78 , pp. 4345
- Lin, Q.¹ Goldfarb, D.L.² Angelopolous, M.³ Sriram, S.R.⁴ Moore, J.S.⁵

5
- 0010223178
- (2000) Proc. SPIE Adv. Resist Technol. Proc. XVII , vol.311 , pp. 3999
- Domke, W.D.¹ Graffenberg, V.L.² Patel, S.³ Rich, G.K.⁴ Cao, H.B.⁵ Nealey, P.F.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.