193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 131-139

  Varanasi, P R ^a   Kwong, R W ^a   Khojasteh, M ^a   Patel, K ^a   Chen, K J ^a   Li, W ^a   Lawson, M C ^a   Allen, R D ^b   Sooriyakumaran, R ^b   Brock, P ^b   Sundberg, L K ^b   Slezak, M ^c   Dabbagh, G ^c   Liu, Z ^c   Nishimura, Y ^d   Chiba, T ^d   Shimokawa, T ^d  

^a IBM RESEARCH   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c JSR Micro   (United States)

^d JSR CORPORATION   (Japan)

Author keywords

193nm photoresists; ArF lithography; Hexafluoroalcohol; Immersion; Methacrylate polymers

Indexed keywords

193 NM PHOTORESITS; ARF LITHOGRAPHY; HEXAFLUOROALCOHOLS; METHACRYLATE MONOMERS; RESIST MATERIALS; SINGLE LAYER PHOTORESISTS;

ALCOHOLS; ASSOCIATION REACTIONS; DISSOLUTION; FLUORINE; MONOMERS; POLYMETHYL METHACRYLATES; SWELLING;

PHOTORESISTS;

EID: 24644520673     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599700     Document Type: Conference Paper

References (4)

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