Studies of acid diffusion in low Ea chemically amplified photoresists

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 309-318

  Wallraff, G M ^b   Medeiros, D R ^a   Larson, C E ^b   Sanchez, M ^b   Petrillot, K ^a   Huang, W S ^a   Rettner, C ^b   Davis, B ^b   Sundberg, L ^b   Hinsberg, W D ^b   Houle, F A ^b   Hoffnagle, J A ^b   Goldfarb, D ^a   Temple, K ^a   Bucchignano, J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Chemically amplified resist; High resolution imaging; Image blur; Post exposure bake

Indexed keywords

CHEMICALLY AMPLIFIED RESISTS; HIGH RESOLUTION IMAGING; IMAGING BLUR; POST-EXPOSURE BAKE;

ACIDS; ACTIVATION ENERGY; DIFFUSION; IMAGING TECHNIQUES; INTERFEROMETRY; LITHOGRAPHY; WATER ABSORPTION;

PHOTORESISTS;

EID: 24644437738     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601759     Document Type: Conference Paper

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