Leaching phenomena and their suppresion in 193 nm immersion lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 5, 2005, Pages 593-602

  Dammel, Ralph R ^a   Pawlowski, Georg ^a   Romano, Andrew ^a   Houlihan, Frank M ^a   Kim, Woo Kyu ^a   Sakamuri, Raj ^a   Abdallah, David ^a   Padmanaban, Munirathna ^a   Dalil Rahman, M ^a   McKenzie, Douglas ^a  

^a AZ Electronic Materials USA Corp   (United States)

Author keywords

Barrier coat; Immersion lithography; Kinetics; Leaching rate; PAG leaching; Photoresist; Top protective coat

Indexed keywords

EID: 22144438696     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.593     Document Type: Article

References (9)

1. R.R. Dammel, F.M. Houlihan, R. Sakamuri, D. Rentkiewicz, A. Romano, "193 nm lithography - taking the plunge", J. Photopolym. Sci. Technol. 17(4), 587-602 (2004).
2. F. M. Houlihan, W.K. Kim, K. Hamilton, A. Dimerli, D. Abdallah, A.R. Romano, R.R. Dammel, G. Pawlowski, R. Sakamuri, A. Raub, S.R.J. Brueck, "Study of barrier coats for application in immersion 193-nm lithography," Proc. SPIE 5753, paper 5753-11 (2005), in press.
3. W. Hinsberg, G. Wallraff, C. Larson, B. Davis, V. Deline, S. Raoux,D. Miller, F. Houle, J. Hoffnagle, M. Sanchez, C. Rettner, L. Sundberg, D. Medeiros, R. Dammel and W. Conley, "Liquid Immersion Lithography Evaluation of Resist Issues," Proc. SPIE 5376, 21-33 (2004).
4. E. Jablonski, V. Prabhu, F.M. Houlihan, R.R. Dammel, A. Romano, unpublished results.
5. S. Robertson, J. Leonard, J. Alexander, F. Huby, and K. Willey, "Characterization and meaningful quantification of resist component leaching into immersion fluid," presentation at the SEMATECH Immersion and 157 nm Symposium, Vancouver, BC, August 3-5, 2004.
6. J.C. Taylor, C.R. Chambers, R. Deschner, R.J. LeSuer, , W. Conley, S.D. Burns, C.G. Willson, "Implications of immersion lithography on 193nm photoresists," Proc. SPIE 5376, 34-43 (2004).
7. W. E. Conley, R. J. LeSuer, A. J. Bard, C. Taylor, C. G. Willson, A. Romano, R. Dammel, J. Flaherty, "Understanding the photoresist surface-liquid interface", Proc. SPIE 5753, paper 5753-10 (2005), in press.
8. S. Khanna, H. Inabe, K. Yamamoto, H. Kanda, K. Mitzutani, Y. Kawabe, Proc. SPIE 5753 (2005), paper no. 09, in print.
9. Cf. M. Toukhy, J. Oberlander, D. Rahman, F. Houlihan, "A study on the dissolution inhibition of poly norbornene hexafluoroisopropanol in aqueous base solutions," Proc. SPIE 5376, 384-391 (2004).