Design of protective topcoats for immersion lithography

Journal of Photopolymer Science and Technology

Volumn 18, Issue 5, 2005, Pages 615-619

  Allen, Robert D ^a   Brock, Phillip J ^a   Sundberg, Linda ^a   Larson, Carl E ^a   Wallraff, Gregory M ^a   Hinsberg, William D ^a   Meute, Jeff ^b   Shimokawa, Tsutomu ^c   Chiba, Takashi ^c   Slezak, Mark ^d  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

^c JSR CORPORATION   (Japan)

^d JSR Micro   (United States)

Author keywords

Fluoropolymers; Immersion lithography; Leaching; PAG extraction; Topcoats

Indexed keywords

EID: 22144461760     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.18.615     Document Type: Article

References (8)

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