Protecting groups for 193-nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 334-343

  Allen, Robert D ^a   Sooriyakumaran, Ratnam ^a   Opitz, Juliann ^a   Wallraff, Gregory M ^a   DiPietro, Richard A ^a   Breyta, Gregory ^a   Hofer, Donald C ^a   Kunz, Roderick R ^a   Jayaraman, Saikumar ^a   Shick, Robert ^a   Goodall, Brian ^a   Okoroanyanwu, Uzodinna ^a   Wilson, C G ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; ACRYLICS; CHEMISTRY; ESTERS; MICROELECTRONICS; PERFORMANCE; PROTECTION; STABILITY; TERPOLYMERS; THERMAL EFFECTS;

PHOTOGENERATED ACIDS; PLASTICIZATION;

PHOTORESISTS;

EID: 0029727825     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241832     Document Type: Conference Paper

References (10)