The influence of photoacid structure on the design and performance of 193-nm resists

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 503-510

  Allen, Robert D ^a   Opitz, Juliann ^a   Larson, Carl E ^a   Wallow, Thomas I ^a   DiPietro, Richard A ^a   Breyta, Gregory ^a   Sooriyakumaran, Ratnam ^a   Hofer, Donald C ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

193 nm photoresists; Photoacid generators; Protecting groups

Indexed keywords

EID: 0000644621     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.503     Document Type: Article

References (13)

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