Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 355-364

  Wallow, Thomas I ^a   Houlihan, Francis M ^a   Nalamasu, Omkaram ^a   Chandross, Edwin A ^a   Neenan, Thomas X ^a   Reichmanis, Elsa ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOACID GENERATORS; SINGLE-LAYER PHOTORESISTS;

COPOLYMERS; DISSOLUTION; EVALUATION; MICROELECTRONICS; MICROMETERS; PHOTOLITHOGRAPHY;

PHOTORESISTS;

EID: 0029727391     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)