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Volumn 55, Issue 6, 2008, Pages 1541-1546

Investigation and modeling of hot carrier effects on performance of 45- and 55-nm NMOSFETs with RF automatic measurement

Author keywords

Cutoff frequency; Hot carrier effect (HCE); In line ground signal signal ground (GSSG) test pad structure; Surface channel resistance model; Transconductance

Indexed keywords

CAPACITANCE; CUTOFF FREQUENCY; GATES (TRANSISTOR); HOT CARRIERS; TRANSCONDUCTANCE;

EID: 44949254183     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2008.921998     Document Type: Article
Times cited : (15)

References (23)
  • 2
    • 29344468684 scopus 로고    scopus 로고
    • Effects of hot-carrier stress on the performance of CMOS low-noise amplifiers
    • Sep
    • S. Naseh, M. Jamal Deen, and C.-H. Chen, "Effects of hot-carrier stress on the performance of CMOS low-noise amplifiers," IEEE Trans. Device Mater. Rel., vol. 5, no. 3, pp. 501-508, Sep. 2005.
    • (2005) IEEE Trans. Device Mater. Rel , vol.5 , Issue.3 , pp. 501-508
    • Naseh, S.1    Jamal Deen, M.2    Chen, C.-H.3
  • 4
    • 13444257633 scopus 로고    scopus 로고
    • MOSFET linearity performance degradation subject to drain and gate voltage stress
    • Dec
    • C. Yu, J. S. Yuan, and H. Yang, "MOSFET linearity performance degradation subject to drain and gate voltage stress," IEEE Trans. Device Mater. Rel., vol. 4, no. 4, pp. 681-689, Dec. 2004.
    • (2004) IEEE Trans. Device Mater. Rel , vol.4 , Issue.4 , pp. 681-689
    • Yu, C.1    Yuan, J.S.2    Yang, H.3
  • 5
  • 6
    • 0033741695 scopus 로고    scopus 로고
    • E. Li, E. Rosenbaum, L. F. Register, J. Tao, and P. Fang, Hot carrier induced degradation in deep submicron MOSFETs at 100 °C, in Proc. 38th Annu. Int. Rel. Phys. Symp., Apr. 2000, pp. 103-107.
    • E. Li, E. Rosenbaum, L. F. Register, J. Tao, and P. Fang, "Hot carrier induced degradation in deep submicron MOSFETs at 100 °C," in Proc. 38th Annu. Int. Rel. Phys. Symp., Apr. 2000, pp. 103-107.
  • 7
    • 0026187962 scopus 로고
    • Observation of MOSFET degradation due to electrical stressing through gate-to-source and gate-to-drain capacitance measurement
    • Jul
    • Y. T. Yeow, C. H. Ling, and L. K. Ah, "Observation of MOSFET degradation due to electrical stressing through gate-to-source and gate-to-drain capacitance measurement," IEEE Electron Device Lett. vol. 12, no. 7, pp. 366-368, Jul. 1991.
    • (1991) IEEE Electron Device Lett , vol.12 , Issue.7 , pp. 366-368
    • Yeow, Y.T.1    Ling, C.H.2    Ah, L.K.3
  • 8
    • 0033748595 scopus 로고    scopus 로고
    • Analysis of hot-carrier-induced degradation in MOSFETs by gate-to-drain and gate-to-substrate capacitance measurements
    • Apr
    • C. T. Hsu, M. M. Lau, Y. T. Yeow, and Z. Q. Yao, "Analysis of hot-carrier-induced degradation in MOSFETs by gate-to-drain and gate-to-substrate capacitance measurements," in Proc. 38th Annu. Int. Rel. Phys. Symp., Apr. 2000, pp. 98-102.
    • (2000) Proc. 38th Annu. Int. Rel. Phys. Symp , pp. 98-102
    • Hsu, C.T.1    Lau, M.M.2    Yeow, Y.T.3    Yao, Z.Q.4
  • 9
    • 0023981086 scopus 로고
    • On the effect of hot-carrier stressing on MOSFET terminal capacitances
    • Mar
    • C. T. Yao, M. Peckerar, D. Friedman, and H. Hughes, "On the effect of hot-carrier stressing on MOSFET terminal capacitances," IEEE Trans. Electron Devices, vol. 35, no. 3, pp. 384-386, Mar. 1988.
    • (1988) IEEE Trans. Electron Devices , vol.35 , Issue.3 , pp. 384-386
    • Yao, C.T.1    Peckerar, M.2    Friedman, D.3    Hughes, H.4
  • 10
    • 0029345912 scopus 로고
    • A study of hot carrier degradation in NMOSFETs by gate capacitance and charge pumping current
    • Jul
    • C. H. Ling, S. E. Tan, and D. S. Ang, "A study of hot carrier degradation in NMOSFETs by gate capacitance and charge pumping current," IEEE Trans. Electron Devices, vol. 42, no. 7, pp. 1321-1328, Jul. 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , Issue.7 , pp. 1321-1328
    • Ling, C.H.1    Tan, S.E.2    Ang, D.S.3
  • 11
    • 23344449696 scopus 로고    scopus 로고
    • MOS RF reliability subject to dynamic voltage stress-modeling and analysis
    • Aug
    • C. Yu and J. S. Yuan, "MOS RF reliability subject to dynamic voltage stress-modeling and analysis," IEEE Trans. Electron Devices, vol. 52, no. 8, pp. 1751-1758, Aug. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.8 , pp. 1751-1758
    • Yu, C.1    Yuan, J.S.2
  • 14
    • 0035308521 scopus 로고    scopus 로고
    • Projecting lifetime of deep submicron MOSFETs
    • Apr
    • E. Li, E. Rosenbaum, J. Tao, and P. Fang, "Projecting lifetime of deep submicron MOSFETs," IEEE Trans. Electron Devices, vol. 48, no. 4, pp. 671-678, Apr. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , Issue.4 , pp. 671-678
    • Li, E.1    Rosenbaum, E.2    Tao, J.3    Fang, P.4
  • 15
    • 0023564219 scopus 로고
    • The relationship between oxide charge and device degradation: A comparative study of n- and p- channel MOSFETs
    • Dec
    • A. Schwerin, W. Hansch, and W. Weber, "The relationship between oxide charge and device degradation: A comparative study of n- and p- channel MOSFETs," IEEE Trans. Electron Devices, vol. ED-34, no. 12, pp. 2493-2500, Dec. 1987.
    • (1987) IEEE Trans. Electron Devices , vol.ED-34 , Issue.12 , pp. 2493-2500
    • Schwerin, A.1    Hansch, W.2    Weber, W.3
  • 18
    • 33646905372 scopus 로고    scopus 로고
    • Systematic analysis and modeling of on-chip spiral inductors for complementary metal oxide semiconductor radio frequency integrated circuits applications
    • Apr
    • M.-C. Tang, Y.-K. Fang, W.-K. Yeh, S. H. Chen, and T.-H. Yeh, "Systematic analysis and modeling of on-chip spiral inductors for complementary metal oxide semiconductor radio frequency integrated circuits applications," Jpn. J. Appl. Phys., vol. 45, no. 4B, pp. 3247-3250, Apr. 2006.
    • (2006) Jpn. J. Appl. Phys , vol.45 , Issue.4 B , pp. 3247-3250
    • Tang, M.-C.1    Fang, Y.-K.2    Yeh, W.-K.3    Chen, S.H.4    Yeh, T.-H.5
  • 19
    • 37749030452 scopus 로고    scopus 로고
    • Miniature RF test structure for on-wafer device testing and in-line process monitoring
    • Jan
    • M.-H. Cho, R. Lee, A.-S. Peng, D. Chen, C.-S. Yeh, and L.-K. Wu, "Miniature RF test structure for on-wafer device testing and in-line process monitoring," IEEE Trans. Electron Devices, vol. 55, no. 1, pp. 462-465, Jan. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.1 , pp. 462-465
    • Cho, M.-H.1    Lee, R.2    Peng, A.-S.3    Chen, D.4    Yeh, C.-S.5    Wu, L.-K.6
  • 21
    • 17644393901 scopus 로고    scopus 로고
    • Gate-capacitance extraction from RF C-V measurements
    • Sep
    • G. T. Sasse, R. de Kort, and J. Schmitz, "Gate-capacitance extraction from RF C-V measurements," in Proc. 34th ESSDERC, Sep. 2004, pp. 113-116.
    • (2004) Proc. 34th ESSDERC , pp. 113-116
    • Sasse, G.T.1    de Kort, R.2    Schmitz, J.3
  • 22
    • 84949634754 scopus 로고    scopus 로고
    • Sensitivity analysis of calibration standards for SOLT and LRRM
    • Nov
    • A. M. E. Safwat and L. Hayden, "Sensitivity analysis of calibration standards for SOLT and LRRM," in Proc. 58th ARFTG Conf. Dig. Fall Nov. 2001, pp. 1-10.
    • (2001) Proc. 58th ARFTG Conf. Dig. Fall , pp. 1-10
    • Safwat, A.M.E.1    Hayden, L.2
  • 23
    • 0036602363 scopus 로고    scopus 로고
    • A simple and analytical parameter-extraction method of a microwave MOSFET
    • Jun
    • I. Kwon, M. Je, K. Lee, and H. Shin, "A simple and analytical parameter-extraction method of a microwave MOSFET," IEEE Trans. Microw. Theory Tech., vol. 50, no. 6, pp. 1503-1509, Jun. 2002.
    • (2002) IEEE Trans. Microw. Theory Tech , vol.50 , Issue.6 , pp. 1503-1509
    • Kwon, I.1    Je, M.2    Lee, K.3    Shin, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.