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Volumn , Issue , 1997, Pages 312-319
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New understanding of LDD CMOS hot-carrier degradation and device lifetime at cryogenic temperatures
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
CRYOGENICS;
GATES (TRANSISTOR);
HOT CARRIERS;
LOW TEMPERATURE OPERATIONS;
SEMICONDUCTOR DOPING;
TRANSCONDUCTANCE;
GATE VOLTAGE STRESS;
LIGHTLY DOPED DRAIN (LDD) MOSFET DEVICES;
MOSFET DEVICES;
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EID: 0030704122
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (35)
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References (11)
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