Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection

Nanotechnology

Volumn 19, Issue 23, 2008, Pages

  Patterson, N ^a   Adams, D P ^a   Hodges, V C ^a   Vasile, M J ^a   Michael, J R ^a   Kotula, P G ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; CHARGED PARTICLES; DRILLING PLATFORMS; ELECTRONS; GALLIUM; ION BEAMS; ION BOMBARDMENT; IONS; NANOPORES; NUCLEAR INSTRUMENTATION; PARTICLE DETECTORS; SILICON;

BEAM APPROACH; BEAM COLUMNS; CHANNEL PLATE; IN-SITU; PARTICLE DETECTION;

NANOSTRUCTURED MATERIALS;

ARTICLE; FOCUSED ION BEAM APPROACH; ION CURRENT; NANOPORE; NANOTECHNOLOGY; PRIORITY JOURNAL; TRANSMISSION ELECTRON MICROSCOPY;

EID: 44949239477     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/23/235304     Document Type: Article

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