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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2720-2723

Formation of a few nanometer wide holes in membranes with a dual beam focused ion beam system

(5) Schenkel, T a Radmilovic, V a Stach, E A a Park, S J a Persaud, A a

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DOPING (ADDITIVES); ELECTRON BEAM LITHOGRAPHY; ETCHING; HEAVY IONS; MAGNETRON SPUTTERING; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BACKSCATTERING; FOCUSED ION BEAMS (FIB); THIN FILM DEPOSITION;

ION BEAM ASSISTED DEPOSITION;

EID: 0942289227 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1622935 Document Type: Conference Paper

Times cited : (44)

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