Effect of substrate temperature and bias voltage on DC magnetron sputtered Fe-N thin films

Journal of Magnetism and Magnetic Materials

Volumn 283, Issue 2-3, 2004, Pages 282-290

  Wang, X ^a   Zheng, W T ^a   Tian, H W ^a   Yu, S S ^a   Wang, L L ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Iron nitride thin films; Magnetron sputtering; Substrate bias voltage; Substrate temperature

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETIZATION; MAGNETRON SPUTTERING; MORPHOLOGY; SQUIDS; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY SCATTERING;

IRON NITRIDE THIN FILMS; SUBSTRATE BIAS VOLTAGE; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 9444252954     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.06.002     Document Type: Article

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