Characterization of tantalum nitride films deposited by reactive sputtering of Ta in N2/Ar gas mixtures

Materials Chemistry and Physics

Volumn 68, Issue 1-3, 2001, Pages 266-271

  Lee, Wen Horng ^a   Lin, Jing Cheng ^a   Lee, Chiapyng ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; MICROSTRUCTURE; SPUTTER DEPOSITION; SUBSTRATES; TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIFFUSION BARRIERS; REACTIVE SPUTTERING; TANTALUM NITRIDE;

THIN FILMS;

EID: 0035253896     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(00)00370-9     Document Type: Article

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