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Physica C: Superconductivity and its Applications

Volumn 425, Issue 1-2, 2005, Pages 52-61

Stoichiometry control of magnetron sputtered Bi2Sr 2Ca1-xYxCu2Oy (0 ≤ x ≤ 0.5) thin film, composition spread libraries: Substrate bias and gas density factors

(2) Sanderson, R J a Hewitt, K C a

a DALHOUSIE UNIVERSITY (Canada)

Author keywords

Bi based cuprates; Composition spread libraries; Cuprate superconductors (high Tc and insulating parent compound); High Tc films; Magnetron sputtering; Resputtering; Stoichiometry; Substrate bias

Indexed keywords

CARBON; MAGNETRON SPUTTERING; STOICHIOMETRY; STRONTIUM; SUBSTRATES; SUPERCONDUCTING FILMS; THIN FILMS;

BI-BASED CUPRATES; HIGH-TC FILMS; RESPUTTERING; SUBSTRATE BIAS;

SUPERCONDUCTING MATERIALS;

EID: 23244449460 PISSN: 09214534 EISSN: None Source Type: Journal
DOI: 10.1016/j.physc.2005.06.002 Document Type: Article

Times cited : (25)

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