Structural, optical and electrical properties of reactively sputtered iron oxynitride films

Journal of Physics D: Applied Physics

Volumn 39, Issue 9, 2006, Pages 1894-1898

  Petitjean, C ^a   Grafoute M ^a   Pierson, J F ^a,b   Rousselot, C ^a   Banakh, O ^c  

^a UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^b INSTITUT JEAN LAMOUR   (France)

^c University of Applied Sciences   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

IRON COMPOUNDS; MAGNETRON SPUTTERING; REACTION KINETICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

ARGON FLOW RATES; EXTINCTION COEFFICIENTS; IRON OXYNITRIDE FILMS; SPECTROSCOPIC ELLIPSOMETRY;

THIN FILMS;

EID: 33646449649     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/9/026     Document Type: Article

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