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Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1356-1360

Pulsed power magnetron sputtering of a niobium target in reactive oxygen and/or nitrogen atmosphere

(4) Fenker, M a Kappl, H a Petrikowski, K a Bretzler, R a

a Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem (Germany)

Author keywords

Niobium oxynitride; Pulsed magnetron sputtering; PVD

Indexed keywords

COATINGS; COMPOSITION; CRYSTALLOGRAPHY; ENERGY DISPERSIVE SPECTROSCOPY; ENVIRONMENTAL TESTING; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

HARDNESS MEASUREMENT; NIOBIUM OXYNITRIDE; NIOBIUM TARGET; PULSED MAGNETRON SPUTTERING;

NIOBIUM;

COATING;

EID: 28844449721 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.074 Document Type: Article

Times cited : (19)

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