The decomposition mechanism of SiO2 with the deposition of oxygen-deficient M(Hf or Zr)Ox films

Thin Solid Films

Volumn 462-463, Issue SPEC. ISS., 2004, Pages 106-109

  Li, Q ^a,b   Wang, S J ^a   Lim, P C ^a   Chai, J W ^a   Huan, A C H ^a,b   Ong, C K ^b  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Deposition; SiO2; XPS

Indexed keywords

CHEMICAL STABILITY; DIELECTRIC THIN FILMS; DIFFUSION INTERFACE FORMATION; LASER DEPOSITION;

DECOMPOSITION; DEPOSITION; MONOLAYERS; OXIDATION; SILICA; SUBSTRATES; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 4344617836     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.009     Document Type: Article

References (20)

1. Kingon A.I., Maria J.P., Streiffer S.K. Nature. 406:2000;1032.
2. Wilk G.D., Wallace R.M., Anthony J.M. J. Appl. Phys. 89:2001;5243.
3. Copel M., Gribelyuk M., Gusev F. Appl. Phys. Lett. 76:2000;436.
4. Maria J.-P., Wicaksana D., Kingon A.I., Busch B., Schulte H., Garfunkel E., Gustafsson T. J. Appl. Phys. 90:2001;3476.
5. Gribelyuk M.A., Callegari A., Gusev E.P., Copel M., Buchanan D.A. J. Appl. Phys. 92:2002;1232.
6. Jeon T.S., White J.M., Kwong D.L. Appl. Phys. Lett. 78:2001;368.
7. Hubbard K.J., Schlom D.G. J. Mater. Res. 11:1996;2757.
8. Misa V., Lucovsky G., Parsons G. MRS Bull. 27:2002;212.
9. Bush B.W., Pluchery O., Chabal Y.J., Muller D.A., Opila R.L., Kwo J.R., Garfunkel E. MRS Bull. 27:2002;206.
10. Wang S.J., Ong C.K., Xu S.Y., Chen P., Tjiu W.C., Chai J.W., Huan A.C.H., Yoo W.J., Lim J.S., Feng W., Choi W.K. Appl. Phys. Lett. 78:2001;1604.
11. Wang S.J., Ong C.K. Appl. Phys. Lett. 80:2002;2541.
12. Wang S.J., Lim P.C., Huan A.C.H., Liu C.L., Chai J.W., Chow S.Y., Pan J.S., Li Q., Ong C.K. Appl. Phys. Lett. 82:2003;2047.
13. Wang S.J., Ong C.K., Xu S.Y., Chen P., Tjiu W.C., Chai J.W., Huan A.C.H., Yoo W.J., Lim J.S., Feng W., Choi W.K. Semicond. Sci. Technol. 16:2001;L13.
14. Tromp R., Rubloff G.W., Balk P., LeGoues R.K. Phys. Rev. Lett. 55:1985;2332.
15. Starodub D., Gusev E.P., Grafunkel E., Gustafsson T. Surf. Rev. Lett. 6:1999;45.
16. Zhang X.-F., Zhang Z. Progress in transmission electron microscopy. Springer Series in Surface Science. vol. 1:2001.
17. Muraoka K. Appl. Phys. Lett. 80:2002;4516.
18. Chang J.P., Yin Y.S. Appl. Phys. Lett. 79:2001;3824.
19. Gutowski M., Jaffe J.E., Liu C.L., Stoker M., Hegde R.I., Rai R.S., Tobin P.J. Appl. Phys. Lett. 80:2002;1897.
20. McKee R.A., Walker F.J., Chisholm M.F. Phys. Rev. Lett. 81:1998;3014.