Thermal behavior of the Au/c -Si3 N4 /Si (111) interface

Journal of Applied Physics

Volumn 103, Issue 8, 2008, Pages

  Flammini, Roberto ^a   Wiame, Fŕd́ric ^b   Belkhou, Rachid ^c   Taleb Ibrahimi, Amina ^c   Spezzani, Carlo ^a   Moras, Paolo ^a   Crotti, Corrado ^a  

^a CNR   (Italy)

^b CNRS   (France)

^c SYNCHROTRON SOLEIL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; PHOTOELECTRON SPECTROSCOPY; SILICON NITRIDE; THERMAL EFFECTS;

NITRIDE LAYER; ROOM TEMPERATURE; SILICON ATOM SEGREGATION;

INTERFACES (MATERIALS);

EID: 43049144279     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2907439     Document Type: Article

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