Effects of annealing on the structure of the Au/Si(1 1 1)-H interface

Surface Science

Volumn 564, Issue 1-3, 2004, Pages 121-130

  Flammini, R ^a,c   Wiame, F ^a   Belkhou, R ^a   Taleb Ibrahimi, A ^a   Gregoratti, L ^b   Barinov, A ^b   Marsi, M ^b   Kiskinova, M ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b SINCROTRONE TRIESTE   (Italy)

^c CNR   (Italy)

Author keywords

Clusters; Gold; Hydrogen atom; Photoemission (total yield); Silicon; Suicides; Surface structure, morphology, roughness, and topography

Indexed keywords

ANNEALING; HYDROGENATION; INTERFACES (MATERIALS); PHOTOEMISSION; SILICON; SUBSTRATES; SURFACE TOPOGRAPHY; THERMAL EFFECTS;

GOLD SILICIDESS; HYDROGEN ATOMS; PHOTOEMISSION (TOTAL YIELD);

GOLD;

EID: 3242880019     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.06.200     Document Type: Article

References (25)

1. J.J. Yeh, J. Hwang, K. Bertness, D.J. Friedman, R. Cao, I. Lindau, Phys. Rev. Lett. 70 (1993) 3768 and references therein.
2. C. Grupp, A. Taleb-Ibrahimi, Phys. Rev. B 57 (1998) 6258.
3. S. Ino, Reflection high energy electron diffraction and reflection electron imaging of surfaces, in: P.K. Larsen, P.J. Dobson (Eds.), Plenum, New York, 1988.
4. Y. Jeon, N. Jisrawi, G. Liang, F. Lu, M. Croft, W.L. McLean, D.L. Hart, N.G. Stoffel, J.Z. Sun, T.H. Geballe, Phys. Rev. B 39 (1985) 5748.
5. R. Losio, K.M. Altmann, F.J. Himpsel, Phys. Rev. B 39 (2000) 808.
6. K. Oura, V.G. Lifshits, A.A. Saranin, A.V. Zotov, M. Katayama, Surf. Sci. Rep. 35 (1999) 1.
7. R. Srinivastan, Y. Tian, I.I. Suni, Surf. Sci. 408 (1998) L698.
8. L.A. Gheber, M. Herhfinkel, G. Gorodetsky, V. Volterra, Appl. Phys. Lett. 69 (1996) 400.
9. J. Terry, R. Cao, C. Wigrena, P. Pianetta, J. Vac. Sci. Technol. A 12 (1994) 1869.
10. T. Okuda, H. Daimon, H. Shigeoka, S. Suga, T. Kinoshita, A. Kakizaki, J. Electron. Spectrosc. Rel. Phenom. 80 (1996) 229.
11. S.L. Molodsov, C. Laubshat, G. Kaindl, A.M. Shikin, V.K. Adamchuk, Phys. Rev. B 44 (1991) 8850.
12. A. Ishizaka, Y. Shiraki, J. Electrochem. Soc. 133 (1986) 666.
13. P.J. Timans, J. Appl. Phys. 74 (1993) 6353.
14. L. Ley, J. Ristein, J. Schäfer, S. Miyazaki, J. Vac. Sci. Technol. B 14 (1996) 3008.
15. G. Hess, P. Parkinson, B. Gong, Z. Xu, D. Lim, M. Downer, S. John, S. Banerjee, J.G. Ekerdt, S.K. Jo, Appl. Phys. Lett. 71 (1997) 2184.
16. C. Grupp, A. Taleb-Ibrahimi, J. Elec. Spectrosc. Rel. Phenom. 101 (1999) 309.
17. W. Swiech, E. Bauer, M. Mundschau, Surf. Sci. 253 (1991) 283.
18. A. Kolmakov, J. Kovac, S. Günther, L. Casalis, L. Gregoratti, M. Marsi, M. Kiskinova, Phys. Rev. B 55 (1997) 4101.
19. J. Kovac, S. Günther, A. Kolmakov, L. Casalis, L. Gregoratti, D. Lonza, M. Marsi, M. Kiskinova, in: J.L. Duggan, I.L. Morgan (Eds.), Photoemission Spectro-Microscopy at Elettra, Aip Press, New York, 1997, p. 753.
20. D. Grozea, E. Bengu, L.D. Marks, Surf. Sci. 461 (2000) 23.
21. J.J. Boland, Surf. Sci. 244 (1991) 1.
22. Z.H. Lu, K. Griffiths, P.R. Norton, T.K. Sham, Phys. Rev. B 44 (1991) 5648.
23. V. De Renzi, R. Biagi, U. Del Pennino, Surf. Sci. 497 (2002) 247.
24. CM. Greenlief, J. Vac. Sci. Technol. A 7 (1989) 1845.
25. B. Ressel, S. Heun, T. Schmidt, K.C. Prince, Defect Diffus. Forum 183 (2000) 181.