Interaction of nitrogen with Si(111)-7 × 7 surfaces at elevated temperatures

Surface Science

Volumn 426, Issue 3, 1999, Pages 373-383

  Ha, Jeong Sook ^a   Park, Kang Ho ^a   Yun, Wan Soo ^b   Ko, Young Jo ^a   Kim, Seong Keun ^b  

^a Korea Basic Science Institute (KBSI)   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MORPHOLOGY; NITROGEN; SCANNING TUNNELING MICROSCOPY; SILICON; SILICON NITRIDE; THERMAL EFFECTS;

ELEVATED TEMPERATURE; THERMAL NITRIDATION;

SURFACE STRUCTURE;

EID: 0032660735     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00370-2     Document Type: Article

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