Surface topography development on ion-beam-sputtered surfaces: Role of surface inhomogeneity induced by ion-beam bombardment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2744-2756

  Moon, Dae Won ^a   Kim, Kyung Joong ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; ION BOMBARDMENT; NICKEL; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR SUPERLATTICES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM ARSENIDE; CHEMICAL STATE; DEPTH RESOLUTION; INCIDENCE ANGLE; SURFACE INHOMOGENEITY;

SURFACE STRUCTURE;

EID: 0030247736     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580196     Document Type: Article

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