Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silica

Applied Physics Letters

Volumn 82, Issue 12, 2003, Pages 1824-1826

  Sankaran, Arvind ^a   Kushner, Mark J ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; FLUOROCARBONS; MONTE CARLO METHODS; MORPHOLOGY; PERMITTIVITY; PLASMA ETCHING; PORE SIZE; POROSITY; POROUS MATERIALS; SURFACE REACTIONS;

PROFILE EVOLUTION;

SILICA;

EID: 0037464201     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1562333     Document Type: Article

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